JPH0645937Y2 - Ｔｆｔパネル - Google Patents
ＴｆｔパネルInfo
- Publication number
- JPH0645937Y2 JPH0645937Y2 JP16846188U JP16846188U JPH0645937Y2 JP H0645937 Y2 JPH0645937 Y2 JP H0645937Y2 JP 16846188 U JP16846188 U JP 16846188U JP 16846188 U JP16846188 U JP 16846188U JP H0645937 Y2 JPH0645937 Y2 JP H0645937Y2
- Authority
- JP
- Japan
- Prior art keywords
- film
- pixel electrode
- sog
- insulating film
- conductive metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010408 film Substances 0.000 claims description 147
- 239000002184 metal Substances 0.000 claims description 71
- 229910052751 metal Inorganic materials 0.000 claims description 71
- 239000010409 thin film Substances 0.000 claims description 35
- 239000000758 substrate Substances 0.000 claims description 32
- 238000009792 diffusion process Methods 0.000 claims description 20
- 239000011521 glass Substances 0.000 claims description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 description 15
- 239000004065 semiconductor Substances 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 11
- 238000005530 etching Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16846188U JPH0645937Y2 (ja) | 1988-12-28 | 1988-12-28 | Ｔｆｔパネル |
| CA000613680A CA1313563C (en) | 1988-10-26 | 1989-09-27 | Thin film transistor panel |
| US07/415,889 US5084905A (en) | 1988-10-26 | 1989-10-02 | Thin film transistor panel and manufacturing method thereof |
| DE68923054T DE68923054T2 (de) | 1988-10-26 | 1989-10-25 | Dünnschicht-Transistortafel und Herstellungsverfahren. |
| EP89119842A EP0366116B1 (en) | 1988-10-26 | 1989-10-25 | Thin film transistor panel and manufacturing method thereof |
| KR1019890015469A KR940004764B1 (ko) | 1988-10-26 | 1989-10-26 | 박막트랜지스타 판넬 및 제조방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16846188U JPH0645937Y2 (ja) | 1988-12-28 | 1988-12-28 | Ｔｆｔパネル |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0289434U JPH0289434U (en]) | 1990-07-16 |
| JPH0645937Y2 true JPH0645937Y2 (ja) | 1994-11-24 |
Family
ID=31457657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16846188U Expired - Lifetime JPH0645937Y2 (ja) | 1988-10-26 | 1988-12-28 | Ｔｆｔパネル |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0645937Y2 (en]) |
-
1988
- 1988-12-28 JP JP16846188U patent/JPH0645937Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0289434U (en]) | 1990-07-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW482938B (en) | Display device and manufacturing method thereof | |
| TWI266420B (en) | Manufacturing method of thin film transistor array panel for display device | |
| JP3072593B2 (ja) | 液晶表示装置の製造方法 | |
| JPH1041521A (ja) | 薄膜トランジスタの製造方法及びその方法によって製造される薄膜トランジスタの構造 | |
| KR20020058270A (ko) | 액정 표시 장치용 어레이 기판 및 그의 제조 방법 | |
| JP2678044B2 (ja) | アクティブマトリクス基板の製造方法 | |
| JPH0225038A (ja) | シリコン薄膜トランジスタおよびシリコン薄膜トランジスタの製造方法 | |
| JPH0645937Y2 (ja) | Ｔｆｔパネル | |
| KR100764273B1 (ko) | 박막트랜지스터 제조방법 | |
| JPH071623Y2 (ja) | Ｔｆｔパネル | |
| JPS60261174A (ja) | マトリツクスアレ− | |
| JPH0543095B2 (en]) | ||
| JP2001337348A (ja) | アレイ基板およびその製造方法 | |
| JPH06334185A (ja) | 薄膜半導体装置 | |
| JPS6178166A (ja) | 薄膜トランジスタ−アレ−とその製造方法 | |
| JPH0612780B2 (ja) | 薄膜トランジスタアレイの製造法 | |
| KR100542307B1 (ko) | Tft-lcd의 제조방법 | |
| KR100560972B1 (ko) | 액정 표시 장치용 박막 트랜지스터 기판의 제조 방법 | |
| JPH07111523B2 (ja) | Ｔｆｔパネル | |
| JPH01165127A (ja) | 表面平坦化法 | |
| KR100205867B1 (ko) | 액티브매트릭스기판의 제조방법 및 그 방법에 의해제조되는액티브매트릭스기판 | |
| JPH0645936Y2 (ja) | 透明電極基板 | |
| KR100267995B1 (ko) | 액정표시장치 및 그 제조방법 | |
| JPH0750736Y2 (ja) | ストレージキャパシタ付きｔｆｔパネル | |
| JP3528388B2 (ja) | トランジスタアレイの製造方法 |